Course: ECE 645. Narrow and Wide Bandgap Semiconductor Device Fabrication (3)
Prerequisite: ECE 445 or ECE 545. Introduction of device fabrication and characterization along with equipment will be presented in this course. This course focuses on process physics and semiconductor device physics dealing with diffusion, ion implantation and epitaxy processes for the doping of the active areas of semiconductor devices. Thin film deposition by sputtering and electron beam evaporation will be explained for the formation of metal ohmic contact and Schottky contact. Photoresist process, photolithographic process, and etching processes will be presented for selecting doping, contact patterning, etc. Concept of device failure analysis, yield analysis, fabrication process induced defects will be elucidated for device yield management. Radiation effects will be studied to enhance the radiation hardness of semiconductor devices. Process modeling will be studied to link with device modeling for optimization of device fabrication process and device structure.